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PDS-H115
Suitable for highly-viscous photoresist in LED and MEMS production

Substantial saving of resist
The use of a high-torque stepper motor as the drive source results in a consistent discharge volume, unimpeded by filter clogging or viscosity change. A repeatable accuracy (0.3%) of discharge is maintained.
・ Repeated precision: ±0.3% (F.S.)
・ Linearity: ±0.5% (F.S.)
・ Resolution: 0.01 ml or below

Contamination free

The pump portion is of tubephragm structure wetted internals are flat and smooth, with a small dead volume. Because the system hardly has a place that allows liquid resist to dwell, production of particles is prevented.

Usable for a variety of coating processes

Since the discharge velocity can be changed freely in a shot, the system is capable of dealing with a variety of resist coating processes including application of a very small amount or in a very short period of time.


Reduction of Downtime

A discharge amount and a discharge time can be set only by entering values in the controller. It can save operator’s time and labor and reduce downtime.

Specification

Model

PDS-H115

Max. discharge capacity

12 mL/shot *

Max. discharge pressure

1.0 MPa

Discharge speed

0.5 to 2.0 mL/sec

Suction speed

0.3 to 2.0 mL/sec

Max. Allowable Viscosity 10,000 mPa·S

 

Flowrate(L/min)
Max. Head(m)
Max. Discharge Pressure(MPa)
Min. Media Temp.(°C)
Max. Media Temp.(°C)
Water Controller Function
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